Our zirconium hafnium inventioncurrently

US Patent for Precursors for zirconium and hafnium oxide ...

A method of making a precursor for a thin film formed by chemical vapor deposition processes, includes mixing ZCl4 with H(tmhd)3 solvent and benzene to form a solution, where Z is an element taken from the group of elements consisting of hafnium and zirconium; refluxing the solution for twelve hours in an argon atmosphere; removing the solvents via vacuum, thereby producing a solid compound ...

Zirconium and hafnium - USGS

Zirconium and hafnium are corrosion-resistant metals that are widely used in the chemical and nuclear industries. Most zirconium is consumed in the form of the main ore mineral zircon (ZrSiO4, or as zirconium oxide or other zirconium chemicals. Zirconium and hafnium are both refractory lithophile elements that have nearly identical charge, ionic radii, and ionic potentials.

US 4217264 A - Microporous Glassy Fillers For Dental Resin ...

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Zirconium - Wikipedia

Zirconium is a chemical element with the symbol Zr and atomic number 40. The name zirconium is taken from the name of the mineral zircon (the word is related to Persian zargun (zircon;zar-gun, "gold-like" or "as gold")), the most important source of zirconium. It is a lustrous, grey-white, strong transition metal that closely resembles hafnium and, to a lesser extent, titanium.

ZIRCONIUM AND HAFNIUM - USGS

hafnium-free zirconium metal is used as cladding for nuclear fuel rod tubes. Hafnium is used in nuclear control rods because of its high thermal neutron absorption cross section. Commercial-grade zirconium, unlike nuclear grade, contains hafnium and is used in the chemical process industries because of its excellent corrosion resistance.

High-molecular weight polymer esters characterised by low ...

1. The technical field. The present invention relates to demonstrate a high characteristic viscosity polymer complex polyesters obtained by the method of polycondensation in the melt phase using titanium catalyst, characterized by a low content of free acetaldehyde (AA) and detecting small degrees of acetaldehyde.

US Patent for Metal composition and process for producing ...

The metal composition and the process for producing same relate to the art of alloy metallurgy.The metal composition based on metals of VIII Group and nitrides of metals of III-VII Groups is characterized in that at least one alloy containing at least one metal of VIII Group and at least one metal of III-VII Groups are disintegrated to powder, placed into a nitrogen-containing atmosphere with ...

Hafnium (Hf) – Alkane's Destiny to Dominate - InvestorIntel

Sep 23, 2015· The production of hafnium-free zirconium is the main source for hafnium. The chemical properties of hafnium and zirconium are nearly identical, which makes the two difficult to separate. After zirconium was chosen as material for nuclear reactor programs in the 1940s, a …

Zirconium and Hafnium - USGS

States was a net exporter of zirconium ore and concentrates in 2000. U.S. exports of zirconium ore and concentrates were 72,900 metric tons (t), a 5% increase from that of 1999 (table 3). The United States was a net exporter of zirconium and hafnium metal in 2000. U.S. exports of unwrought zirconium

Precursors for zirconium and hafnium oxide thin film ...

May 07, 2003· A method of forming a ZOx thin film, where Z is an element taken from the group of elements consisting of hafnium and zirconium, on a semiconductor device, comprising: preparing a suitable substrate, including building semiconductor structures thereon; depositing a layer of ZOx, on the semiconductor structure by a process taken from the group ...

Precursors for zirconium and hafnium oxide thin film ...

Jul 01, 2003· A method of making a precursor for a thin film formed by chemical vapor deposition processes, includes mixing ZCl 4 with H(tmhd) 3 solvent and benzene to form a solution, where Z is an element taken from the group of elements consisting of hafnium and zirconium; refluxing the solution for twelve hours in an argon atmosphere; removing the solvents via vacuum, thereby producing a solid …

US6472337B1 - Precursors for zirconium and hafnium oxide ...

A method of making a precursor for a thin film formed by chemical vapor deposition processes, includes mixing ZCl 4 with H(tmhd) 3 solvent and benzene to form a solution, where Z is an element taken from the group of elements consisting of hafnium and zirconium; refluxing the solution for twelve hours in an argon atmosphere; removing the solvents via vacuum, thereby producing a solid compound ...

EP1308419A1 - Precursors for zirconium and hafnium oxide ...

A method of making a precursor for a thin film formed by chemical vapor deposition processes, includes mixing ZCl 4 with H(tmhd) 3 solvent and hydrocarbon solvent such as benzene to form a solution, where Z is an element taken from the group of elements consisting of hafnium and zirconium; refluxing the solution for twelve hours in an argon atmosphere; removing the solvents via vacuum, thereby ...

US Patent # 4,217,264. Microporous glassy fillers for ...

Hafnium is a chemical twin of zirconium for purposes of this invention, except that hafnium has greater x-ray opacification capacities than zirconium, therefore requiring less hafnium than zirconium to produce equal x-ray opacity. Tin may also be used for this purpose.

PROPERTIES OF ZIRCONIUM Physical Properties It

PROPERTIES OF ZIRCONIUM 2.1 Physical Properties Zirconium is the 40. th . element in the periodic table. It belongs to the titanium subgroup, subgroup IVB, in which hafnium is also placed. Zirconium occurs naturally in the form of five isotopes with mass numbers of 90, 91, 92, 94 and 96 and corresponding natural

Glycine-free antiperspirant salts with Betaine for ...

A glycine-free aluminum and/or zirconium Betaine salt having a metal to chloride molar ratio in the range of 0.3-2.5:1, a Betaine:aluminum molar ratio in the range of 0.05-1.0:1 and/or a Betaine:zirconium molar ratio in the range of 0.2-3.0:1, wherein the Betaine is used in its normal form described in Formula I, or in its derivative form of Betaine hydrochloride, described in Formula IA: ##STR1##

Hafnium - Wikipedia

Hafnium is a chemical element with symbol Hf and atomic number 72. A lustrous, silvery gray, tetravalent transition metal, hafnium chemically resembles zirconium and is found in many zirconium minerals.Its existence was predicted by Dmitri Mendeleev in 1869, though it was not identified until 1923, by Coster and Hevesy, making it the last stable element to be discovered.

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Separation of Zirconium and Hafnium - SAMaterials

The Market price of low Hafnium Zirconium materials could cost 50~ more compared with high Hf Zirconium. Stanford Advanced Materials provides high purity crystal bars of Zirconium as your Zr source. Both low Hafnium and high hafnium product is available. Hf content of our crystal bar could be lower than 250ppm.

Method for prevention of acute graft-versus-host disease ...

The invention relates to medicine, namely to Hematology, and can be used for modulation of the immune response, in particular for the prevention of acute reaction, …

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